The thing I didn't understand after watching that video was why you need such an exotic solution to produce EUV light. We can make lights no problem in the visible spectrum, we can make xray machines easily enough that every doctors office can afford one, what is it specifically about those wavelengths that are so tricky.
There is such a thing as X-ray lithography, but it comes with significant challenges that make it not really worth it compared to EUV.
It really is the specific wavelength. Higher or lower is easier. But euv has tricky properties which make it feasible for Lithography (although just barely it you have a look at the optics) but hard to produce with high intensities.
The issue isn't in generating short wavelength light, it's in focusing it accurately enough to print a pattern with trillions of nanoscale features with few defects. We can't really use lenses since every material we could use is opaque to high energy photons so we need to use mirrors, which still absorb a lot of the light energy hitting them. Now this only explains why we need all the crazy stuff that asml puts in it's EUV machines to use near x-ray light, but not why they don't use x-ray or higher energy photons. I believe the answer to this is just that the mirrors they can use for EUV are unacceptably bad for anything higher, but I'm not sure