> IBM and its partners conduct this work at a leading semiconductor research facility in Albany, New York, which will soon be home to a High Numerical Aperture Extreme Ultraviolet (High NA EUV) lithography tool, essential for the future of logic scaling. Developed by ASML, this technology enables ultra‑precise circuit printing, supporting the creation of smaller, more powerful chips.

I'm guessing that this is the technology that is developed by Cymer (ASML subsidiary) in California, correct? Is there competing technology? I know xLight is trying to make some inroads on their own version of this EUV tech. I have not heard about any progress though.